Wafer-Level RF Characterization on MPI Probe Systems

Accurate wafer-level RF characterization depends on more than VNA performance alone. Probe system stability, calibration quality, measurement repeatability, and the overall test setup all contribute to measurement integrity.

In this joint webinar with Rohde & Schwarz, Dr. Andrej Rumiantsev, Director of RF Technologies at MPI Corporation, discusses how MPI RF probe systems integrate with the R&S®ZNA vector network analyzer to support reliable, high-quality on-wafer RF measurements.

The 60-minute session covers practical considerations for RF characterization across both R&D and production-oriented environments, including:

Setup repeatability and measurement integrity
Practical considerations for on-wafer S-parameter measurements
The relationship between stable probing, calibration, and VNA performance
Scaling RF characterization from development to production-oriented testing

The webinar is intended for engineers working in RF IC development, process monitoring, device characterization, and design validation who are looking to improve measurement consistency and confidence at the wafer level.

Originally presented in collaboration with Rohde & Schwarz.

Additional Resources from Rohde & Schwarz →
Wafer Level RF Characterization on MPI Probe Systems | Rohde & Schwarz
On-wafer testing | Rohde & Schwarz